The ZEISS 1500XB Series CrossBeam® workstations combine the outstanding
imaging capabilities of the GEMINI field emission column with a high
performance focused ion beam. This makes the 1500XB CrossBeam® series
the ultimate research tool for material analysis and semiconductor
applications.
The 1500XB CrossBeam® series offers a comprehensive and versatile gas
injection system for ion beam deposition of metals or insulators and for
enhanced etching.
Two different models, together with a wide range of additional
accessories and analytical capabilities, make the ZEISS 1500XB CrossBeam®
workstation the perfect solution for TEM sample preparation, cross
section investigation, three dimensional structural examination, failure
analysis and MEMS.
System
Features :
•Ultra-high resolution for
structural and material analysis and semiconductor applications
•Versatile gas injection system for ion beam material deposition and
selective / enhanced etching
•CrossBeam® provides unique live SEM imaging during milling, polishing
and deposition
•Two infra-red CCD chamber cameras for safe specimen handling and
navigation.
•Additional accessory ports for EDS and SIMS detectors