Zeiss Aims 45i system
Based on an entirely new platform the system enables the emulation of future 193 nm immersion scanners.
Main system improvements of the AIMS? 45-193i include polarised illumination and a novel vector effect emulation capability which allows the study of rigorous polarisation effects as they appear from reticles and the scanner technology itself.
The system achieves specifications enabling emulation of upcoming scanner generations already today.
Features & Benefits
Features | Benefits |
NA up to 1.4 | Enabling the emulation of future 193 nm immersion scanners for 45 nm node |
Mask face down | Scanner equivalent beam path |
Scanner equivalent polarisation settings (linear & tangential) | Setting of all types of scanner illumination |
Full vector effect emulation capability | Allows the emulation of vector effects induced by high NA imaging |
Multi off-axis pattern illumination | Quick and easy exchangeable off-axis illumination device for 20 patterns |
New beam homogenizer | Ensures contrast fidelity and CD uniformity |
Piezo z-drive | Highly precise best focal plane determination and repeatability |
Special system housing | Temperature control |
Vibration isolation | Ensures very tight transmission and CD repeatability |
High accuracy stage | Allows for precise mask positioning |
Separated beam paths VIS/DUV | Higher optics stability at advanced and improved optical settings |
Overview camera | Quick and easy mask navigation and alignment |
Automated alignment | Saving of operator and tool time at high accuracy |
The CCD camera is in the same position as the wafer below the mask enabling scanner comparable emulation conditions. Looking onto a mask in the same way as a scanner the AIMS 45-193i achieves significant tighter specifications.
