Zeiss Aims 45i system
Based on an entirely new platform the system enables the emulation of future 193 nm immersion scanners.
Main system improvements of the AIMS? 45-193i include polarised illumination and a novel vector effect emulation capability which allows the study of rigorous polarisation effects as they appear from reticles and the scanner technology itself.
The system achieves specifications enabling emulation of upcoming scanner generations already today.
Features & Benefits
NA up to 1.4
Enabling the emulation of future 193 nm immersion scanners for 45 nm node
Mask face down
Scanner equivalent beam path
Scanner equivalent polarisation settings (linear & tangential)
Setting of all types of scanner illumination
Full vector effect emulation capability
Allows the emulation of vector effects induced by high NA imaging
Multi off-axis pattern illumination
Quick and easy exchangeable off-axis illumination device for 20 patterns
New beam homogenizer
Ensures contrast fidelity and CD uniformity
Highly precise best focal plane determination and repeatability
Special system housing
Ensures very tight transmission and CD repeatability
High accuracy stage
Allows for precise mask positioning
Separated beam paths VIS/DUV
Higher optics stability at advanced and improved optical settings
Quick and easy mask navigation and alignment
Saving of operator and tool time at high accuracy
The CCD camera is in the same position as the wafer below the mask enabling scanner comparable emulation conditions. Looking onto a mask in the same way as a scanner the AIMS 45-193i achieves significant tighter specifications.