Zeiss Aims 45i system

The novel AIMS? 45-193i offering a maximum NA of 1.4 meets the stringent requirements for advanced photomask evaluation for the 45 nm node.
Based on an entirely new platform the system enables the emulation of future 193 nm immersion scanners.
Main system improvements of the AIMS? 45-193i include polarised illumination and a novel vector effect emulation capability which allows the study of rigorous polarisation effects as they appear from reticles and the scanner technology itself.
The system achieves specifications enabling emulation of upcoming scanner generations already today.

Features & Benefits
Features	Benefits
NA up to 1.4	Enabling the emulation of future 193 nm immersion scanners for 45 nm node
Mask face down	Scanner equivalent beam path
Scanner equivalent polarisation settings (linear & tangential)	Setting of all types of scanner illumination
Full vector effect emulation capability	Allows the emulation of vector effects induced by high NA imaging
Multi off-axis pattern illumination	Quick and easy exchangeable off-axis illumination device for 20 patterns
New beam homogenizer	Ensures contrast fidelity and CD uniformity
Piezo z-drive	Highly precise best focal plane determination and repeatability
Special system housing	Temperature control Acoustical isolation Contamination risk reduction
Vibration isolation	Ensures very tight transmission and CD repeatability
High accuracy stage	Allows for precise mask positioning
Separated beam paths VIS/DUV	Higher optics stability at advanced and improved optical settings
Overview camera	Quick and easy mask navigation and alignment
Automated alignment	Saving of operator and tool time at high accuracy
To approach exact real world scanner illumination conditions the optical beam path is completely inverted and the mask is now handled "face down". The CCD camera is in the same position as the wafer below the mask enabling scanner comparable emulation conditions. Looking onto a mask in the same way as a scanner the AIMS 45-193i achieves significant tighter specification s.

To guarantee best optical performance with AIMS measurements the visible light beam path has been separated from the DUV beam path enabling the usage of optimally adjusted optics. A new beam homogenizer is implemented in the AIMS 45-193i providing best uniformity results for field and pupil homogeneity.